Olympus CH Microscope

Olympus CH

Condition: used, This listing is for the Olympus CH30RF200 Microscope. The unit is in full working condition and ready for immediate use. Compact and reliable microscope designed for routine laboratory analysis, offering clear optics, stable illumination, and user-friendly operation suitable for educational and research environments Hnsdeyz Da Depfx Adren Transparency Report and Technical Audit: • Source Pedigree: Biotech / Research Facility • Condition: Direct-from-Bench (Decontaminated/Original) • Power-On Test: Verified; Digital display active, lighting operational, and fan system engaged. • Integrity: 100% Original Parts (Non-Refurbished) Notice for Procurement: This unit is sold As-Is. While we verify the power-on status and physical integrity, we do not perform analytical validation, fluidic testing, or operational calibration. Ideal for labs with in-house technical expertise or existing service agreements. Sustainability Impact: By choosing Direct Reuse, your facility avoids the carbon footprint of new manufacturing and prevents specialized materials from entering waste streams. Direct-to-Lab reuse is the most carbon-efficient way to equip a modern laboratory

Year of construction: 1997, condition: excellent (used), functionality: fully functional, machine/vehicle number: PP120/40, Hot Wall Pulsed Plasma Nitriding Furnace (tandem with 2 bases) Control system was refurbished in 2018 Furnace Model : Plateg PP120/40 Loading Dimensions Diameter : 1000 mm Height : 1250 mm Max. Load Weight : 1000 kg (gross) Plasma Power : 40 kVA Hnsdpfowmfyvsx Adron Heaters Power : 3x13,5 kW, (3 zones) Electrical Connection : 400V 3 phase 50 Hz

Year of construction: 2002, condition: excellent (used), functionality: fully functional, Dear Mr./Mrs, we have opportunity to offer you PLATEG plasma (ion) nitriding equipment. Chamber is with hot wall. Equipment is in excellent condition, fully functional, without any problems, ready for use. Equipment characteristic: - Dimensions of construction: 2700 mm x 1250 mm x 800 mm - Dimensions of chamber: Diameter 1000 mm x 1200 mm - Maximum dimension of nitriding batch: Dimeter 900 mm x 900 mm - Total equipment power: 70 kVA - Power of heaters: 30 kW - Power of plasma supply (BIAS): 30 kW Hjdpevfm I Hefx Adronn - Plasma supply is unipolar, voltage 0-1000V, current 0-60A, DC to 33 kHz, pulse on and pulse off adjustable - Plasma supply (BIAS) is only one year old, bought from Germany (El Connect company) - Vacuum pump: Pffeifer vacuum 65 - Vacuum system is controlled by new electrical cabinet with PLC and HMI - 4 MFC for dosing gasses - Plasma nitriding process, post oxidation process Company Planit is also giving assembly services of this equipment, maintenance manual, user manual, technology (nitriding and oxidation) and also service. For any question, don't hesitate to ask. Best regards.